Design a symmetrical film stack as a negative index metamaterial

Yi-Jun Jen; Wei-Chih Liu; Ci-Yao Jheng; Chih-Chieh Yang

doi:10.1117/12.2062474

27 August 2014 Design a symmetrical film stack as a negative index metamaterial

Yi-Jun Jen, Wei-Chih Liu, Ci-Yao Jheng, Chih-Chieh Yang

Proceedings Volume 9172, Nanostructured Thin Films VII; 917204 (2014) https://doi.org/10.1117/12.2062474
Event: SPIE NanoScience + Engineering, 2014, San Diego, California, United States

Abstract

In this work, the equivalent Herpin index and phase thickness of a symmetrical film stack that consists of a dielectric film D and a metal film M are analyzed using the film matrix method. Five-layered symmetrical MDMDM film stacks in which the thickness of each film is less than 1/10 of the incident wavelength are utilized. The positive real part of the equivalent Herpin index and the negative real part of the phase thickness result in a negative real part of the equivalent refractive index. The range of refractive indices of D and M that lead to a negative refractive index of the overall material is developed as a procedure. When a p-polarized light wave obliquely propagates into the material with the negative refractive index, negative refraction and backward wave propagation occur. To reduce the loss in the negative index metamaterial, a porous metal film is introduced as a substitute for the metal film M in MDMDM to increase the feasibility of the use of the metamaterial as an optical coating.

Citation Download Citation

Yi-Jun Jen, Wei-Chih Liu, Ci-Yao Jheng, and Chih-Chieh Yang "Design a symmetrical film stack as a negative index metamaterial", Proc. SPIE 9172, Nanostructured Thin Films VII, 917204 (27 August 2014); https://doi.org/10.1117/12.2062474

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