UV to IR laser damage of Magnetron Sputtering films submitted to multiple sub-picosecond pulses

Dam-Bé L. Douti; Christophe Hecquet; Thomas Bégou; Mireille Commandré; Laurent Gallais

doi:10.1117/12.2068176

31 October 2014 UV to IR laser damage of Magnetron Sputtering films submitted to multiple sub-picosecond pulses

Dam-Bé L. Douti, Christophe Hecquet, Thomas Bégou, Mireille Commandré, Laurent Gallais

Proceedings Volume 9237, Laser-Induced Damage in Optical Materials: 2014; 92370I (2014) https://doi.org/10.1117/12.2068176
Event: SPIE Laser Damage, 2014, Boulder, Colorado, United States

Abstract

We report on the laser-induced damage threshold at 500fs of optical films made by Magnetron Sputtering and submitted to single and multiple irradiations at different harmonics of an Ytterbium laser (1030nm, 515nm and 343nm). Single layers of SiO₂, HfO₂, and Nb₂O₅ as bare fused silica samples are under investigation.

Citation Download Citation

Dam-Bé L. Douti, Christophe Hecquet, Thomas Bégou, Mireille Commandré, and Laurent Gallais "UV to IR laser damage of Magnetron Sputtering films submitted to multiple sub-picosecond pulses", Proc. SPIE 9237, Laser-Induced Damage in Optical Materials: 2014, 92370I (31 October 2014); https://doi.org/10.1117/12.2068176

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