Nanofabrication with sub-50nm features by imprinting-induced cracks

Liangping Xia; Man Zhang; Zheng Yang; Shaoyun Yin; Chunlei Du

doi:10.1117/12.2073501

5 November 2014 Nanofabrication with sub-50nm features by imprinting-induced cracks

Liangping Xia, Man Zhang, Zheng Yang, Shaoyun Yin, Chunlei Du

Proceedings Volume 9272, Optical Design and Testing VI; 92720K (2014) https://doi.org/10.1117/12.2073501
Event: SPIE/COS Photonics Asia, 2014, Beijing, China

Abstract

Nanofabrication is the foundation of nanophotonics and has become a research hotspot in the last decades. The method annealing crack is proposed to transfer the nanocracks from ultraviolet (UV) resist to other photonic materials. The method is demonstrated by simulating the inner stress distribution with the thermal-structure analysis. In addition, the parameter influence to the maximum stress is discussed and the results indicate that the annealing temperature has a large effect. The method is simple, low cost, high efficiency and is a good candidate to fabricate nanophotonic structures with critical size less than 50nm.

Citation Download Citation

Liangping Xia, Man Zhang, Zheng Yang, Shaoyun Yin, and Chunlei Du "Nanofabrication with sub-50nm features by imprinting-induced cracks", Proc. SPIE 9272, Optical Design and Testing VI, 92720K (5 November 2014); https://doi.org/10.1117/12.2073501

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