Analysis of distinct scattering of extreme ultraviolet phase and amplitude multilayer defects with an actinic dark-field microscope

Lukas Bahrenberg; Stefan Herbert; Jenny Tempeler; Aleksey Maryasov; Oskar Hofmann; Serhiy Danylyuk; Rainer Lebert; Peter Loosen; Larissa Juschkin

doi:10.1117/12.2085929

13 March 2015 Analysis of distinct scattering of extreme ultraviolet phase and amplitude multilayer defects with an actinic dark-field microscope

Lukas Bahrenberg, Stefan Herbert, Jenny Tempeler, Aleksey Maryasov, Oskar Hofmann, Serhiy Danylyuk, Rainer Lebert, Peter Loosen, Larissa Juschkin

Author Affiliations +

Proceedings Volume 9422, Extreme Ultraviolet (EUV) Lithography VI; 942229 (2015) https://doi.org/10.1117/12.2085929
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

The authors report on experimental and simulative scattering analyses of phase and amplitude defects found in extreme ultraviolet multilayer mirrors, such as mask blanks for EUV lithography. The goal of the analyses is to develop a novel mask blank inspection procedure using one single inspection tool that allows to determine whether a defect is a surface type (amplitude) defect, or a buried type (phase) defect. The experiments were carried out with an actinic dark-field reflection microscope. Programmed defects of both types were fabricated, using different nanostructuring techniques. Analytical and rigorous scattering simulations were carried out to predict and support the experimental results.

Citation Download Citation

Lukas Bahrenberg, Stefan Herbert, Jenny Tempeler, Aleksey Maryasov, Oskar Hofmann, Serhiy Danylyuk, Rainer Lebert, Peter Loosen, and Larissa Juschkin "Analysis of distinct scattering of extreme ultraviolet phase and amplitude multilayer defects with an actinic dark-field microscope", Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 942229 (13 March 2015); https://doi.org/10.1117/12.2085929

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