Development of EUV scatterometer with high-harmonic-generation EUV source for nano-scale grating measurement

Chia-Liang Yeh; Yi-Sha Ku; Yi-Chen Hsieh; Chia-Hung Cho

doi:10.1117/12.2194234

20 August 2015 Development of EUV scatterometer with high-harmonic-generation EUV source for nano-scale grating measurement

Chia-Liang Yeh, Yi-Sha Ku, Yi-Chen Hsieh, Chia-Hung Cho

Author Affiliations +

Proceedings Volume 9556, Nanoengineering: Fabrication, Properties, Optics, and Devices XII; 95561F (2015) https://doi.org/10.1117/12.2194234
Event: SPIE Nanoscience + Engineering, 2015, San Diego, California, United States

Abstract

We have developed a EUV scatterometer using a focused high-order harmonic generation (HHG) source for nano-scale grating measurement. The coherent light source with multiple discrete wavelengths of 25-35 nm was pumped by a tabletop Ti:sapphire laser system. A charge-couple-device (CCD) camera directly records the diffraction image of the zero and the first order diffraction information from the grating samples. The grating structure can be reconstructed base on the calculations from the location and the intensity distribution of diffraction pattern.

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Chia-Liang Yeh, Yi-Sha Ku, Yi-Chen Hsieh, and Chia-Hung Cho "Development of EUV scatterometer with high-harmonic-generation EUV source for nano-scale grating measurement ", Proc. SPIE 9556, Nanoengineering: Fabrication, Properties, Optics, and Devices XII, 95561F (20 August 2015); https://doi.org/10.1117/12.2194234

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