All these components were manufactured using Plasma Assisted Reactive Magnetron Sputtering (PARMS) technics offered by the HELIOS machine and monitored in real time with an OMS5000 in-situ optical monitoring, both developed by BUHLER Optics. Compressive mechanical stress of 364 MPa and 55 MPa respectively for SiO2 and Nb2O5 are measured, final sag of 326 nm and 13 nm, and uniformity from -0.05% to 0.10% and from -0.10% to 0.20% are obtained respectively for the two manufactured filters. |
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CITATIONS
Cited by 1 scholarly publication.
Optical filters
Silica
Optics manufacturing
Sputter deposition
Plasma
Interference filters
Refractive index