Direct in situ GDD measurement in optical coating process

S. Schlichting; T. Willemsen; H. Ehlers; U. Morgner; D. Ristau

doi:10.1117/12.2191215

23 September 2015 Direct in situ GDD measurement in optical coating process

S. Schlichting, T. Willemsen, H. Ehlers, U. Morgner, D. Ristau

Proceedings Volume 9627, Optical Systems Design 2015: Advances in Optical Thin Films V; 96271S (2015) https://doi.org/10.1117/12.2191215
Event: SPIE Optical Systems Design, 2015, Jena, Germany

Abstract

In the presented work a fast frequency domain measurement system to determine group delay (GD) and group delay dispersion (GDD) of optical coatings is proposed. The measurements are performed in situ directly on moving substrates during the thin film coating process. The method is based on a Michelson interferometer, which is equipped with a high power broad band light source and a fast spectrometer. Especially for the production of chirped mirrors it is advantageous to obtain group delay and group delay dispersion data of the last layers. This additional information allows for online corrections of coating errors to enhance the precision of complex interference filters for short pulse applications.

Citation Download Citation

S. Schlichting, T. Willemsen, H. Ehlers, U. Morgner, and D. Ristau "Direct in situ GDD measurement in optical coating process", Proc. SPIE 9627, Optical Systems Design 2015: Advances in Optical Thin Films V, 96271S (23 September 2015); https://doi.org/10.1117/12.2191215

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