Contact hole patterning by electric-field assisted assembly of core-shell nanoparticles

Xuexue Guo; Lan Lin; Theresa S. Mayer

doi:10.1117/12.2219503

22 March 2016 Contact hole patterning by electric-field assisted assembly of core-shell nanoparticles

Xuexue Guo, Lan Lin, Theresa S. Mayer

Proceedings Volume 9777, Alternative Lithographic Technologies VIII; 977719 (2016) https://doi.org/10.1117/12.2219503
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

In this paper, we experimentally demonstrated a new technique of electric-field assisted assembly of core-shell particles to create uniform contact hole array with complex geometries. A spatially varying dielectrophoretic (DEP) force created by lithographically defined guiding features is used to control the particle position. The influence of the predefined guiding features on contact hole pattern displacement is systematically studied. The results show that the center-to-center spacing rather than the size and shape of the guiding features determines the particle placement, which indicates the self-healing potential of this technique.

Citation Download Citation

Xuexue Guo, Lan Lin, and Theresa S. Mayer "Contact hole patterning by electric-field assisted assembly of core-shell nanoparticles", Proc. SPIE 9777, Alternative Lithographic Technologies VIII, 977719 (22 March 2016); https://doi.org/10.1117/12.2219503

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