Intra track backside cleaning optimization to reduce the focus spot in Immersion lithography cluster

Nathalie Frolet; Emma Porcheron; Karine Jullian; Michael May; Yuji Tanaka; Masahiko Harumoto; Raluca Tiron

doi:10.1117/12.2614242

13 June 2022 Intra track backside cleaning optimization to reduce the focus spot in Immersion lithography cluster

Nathalie Frolet, Emma Porcheron, Karine Jullian, Michael May, Yuji Tanaka, Masahiko Harumoto, Raluca Tiron

Proceedings Volume PC12055, Advances in Patterning Materials and Processes XXXIX; PC120550M (2022) https://doi.org/10.1117/12.2614242
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

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Nathalie Frolet, Emma Porcheron, Karine Jullian, Michael May, Yuji Tanaka, Masahiko Harumoto, and Raluca Tiron "Intra track backside cleaning optimization to reduce the focus spot in Immersion lithography cluster", Proc. SPIE PC12055, Advances in Patterning Materials and Processes XXXIX, PC120550M (13 June 2022); https://doi.org/10.1117/12.2614242

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