Damage-free pinpoint particle removal for EUV pellicle cleaning

Hyun-Gyu Kang; Dong Hyeon Kwon; Tae-Gon Kim; Jin-Ho Ahn; Byung-Hoon Lee; Jin-Goo Park; Hwan Seok Seo; Hee Bom Kim

doi:10.1117/12.2641583

16 November 2022 Damage-free pinpoint particle removal for EUV pellicle cleaning

Hyun-Gyu Kang, Dong Hyeon Kwon, Tae-Gon Kim, Jin-Ho Ahn, Byung-Hoon Lee, Jin-Goo Park, Hwan Seok Seo, Hee Bom Kim

Proceedings Volume PC12293, Photomask Technology 2022; PC1229308 (2022) https://doi.org/10.1117/12.2641583
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States

Abstract

An extreme ultraviolet (EUV) pellicle is employed to prevent contamination on a EUV mask. The EUV pellicle, a high-priced membrane, gets contaminated during both the fabrication process and exposure. The lifetime of the pellicle can be extended by the removal of these contaminants. In this study, a particle removal technique for the EUV pellicle was developed. A functionalized atomic force microscopy (AFM) probe and programable particle contamination system were developed for particle removal and evaluation of the technique, respectively. The particle was removed with a pinpoint technique and the inherent vibration of the free-standing membrane was suppressed during the process. The process window of the proposed pinpoint cleaning technique was investigated to ensure damage-free particle removal and the nanomanipulated functionalized probe resulted in efficient particle removal from the pellicle surface without damage.

Conference Presentation

Citation Download Citation

Hyun-Gyu Kang, Dong Hyeon Kwon, Tae-Gon Kim, Jin-Ho Ahn, Byung-Hoon Lee, Jin-Goo Park, Hwan Seok Seo, and Hee Bom Kim "Damage-free pinpoint particle removal for EUV pellicle cleaning", Proc. SPIE PC12293, Photomask Technology 2022, PC1229308 (16 November 2022); https://doi.org/10.1117/12.2641583

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