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17 March 2023 Holographic alignment of distant patterns using cascaded metasurfaces
Andrew McClung, Babak Mirzapourbeinekalaye, Amir Arbabi
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Proceedings Volume PC12432, High Contrast Metastructures XII; PC124320W (2023) https://doi.org/10.1117/12.2650492
Event: SPIE OPTO, 2023, San Francisco, California, United States
Abstract
Sophisticated techniques to accurately align patterns have been developed that predominantly address the overlay of proximal layers in layer-by-layer processes that are separated by short, micron-scale distances. However, in some applications such as in flat optics, accurate, 3D alignment of workpieces whose patterns may be separated by large distances is desirable. Here, we describe an alignment scheme based on the far-field of a cascade of metasurface elements suitable for accurately aligning patterns separated by millimeter-scale distances. By using an 850nm laser illumination, we demonstrate registration accuracies of 10nm laterally and 50nm axially for patterns separated by mm-scale distances.
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Andrew McClung, Babak Mirzapourbeinekalaye, and Amir Arbabi "Holographic alignment of distant patterns using cascaded metasurfaces", Proc. SPIE PC12432, High Contrast Metastructures XII, PC124320W (17 March 2023); https://doi.org/10.1117/12.2650492
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KEYWORDS
Optical alignment
Holography
Fabrication
Holograms
Microelectronics
Optical components
Optics manufacturing
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