Systematic influence of line edge roughness on the line width measured by scatterometry

Thomas Siefke; Sebastian Heidenreich

doi:10.1117/12.2675801

23 August 2023 Systematic influence of line edge roughness on the line width measured by scatterometry

Thomas Siefke, Sebastian Heidenreich

Proceedings Volume PC12619, Modeling Aspects in Optical Metrology IX; PC1261906 (2023) https://doi.org/10.1117/12.2675801
Event: SPIE Optical Metrology, 2023, Munich, Germany

Abstract

In optical critical dimension metrology, experimental findings have shown that the line edge is systematically underestimated compared to SEM or AFM measurements. While these methods respond to the volume density, optical methods are sensitive to the permittivity. Due to line edge roughness there is a systematical deviation between these parameters. We discuss an analytic upper limit estimation for the contribution of LER. For low index gratings (resist, glass) the contribution is about 1 nm, for high index gratings the contribution may be as high as 5 nm rendering this crucial for sub-nanometer metrology.

Conference Presentation

Citation Download Citation

Thomas Siefke and Sebastian Heidenreich "Systematic influence of line edge roughness on the line width measured by scatterometry", Proc. SPIE PC12619, Modeling Aspects in Optical Metrology IX, PC1261906 (23 August 2023); https://doi.org/10.1117/12.2675801

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