Presentation
9 March 2024 Full InGaN red emission on different InGaN pseudo-substrates for native full color micro-displays
Author Affiliations +
Abstract
To fabricate native and monolithic full color micro-displays with a pixel pitch below 10 µm, the three primary colors should be achieved with the InGaN alloy. The prerequisite is to get an efficient red emission with thin InxGa1-xN quantum well (QW) width and an In content of 35%. However, the In content is limited to 25% when grown on GaN. A full InGaN structure combined with different types of relaxed InGaN pseudo-substrates are used to reduce the strain in the active zone. Red electroluminescence was obtained until 650 nm. Homogeneous red emitting InGaN based QWs were also demonstrated.
Conference Presentation
© (2024) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Amélie Dussaigne, Frederic Barbier, Patrick Le Maitre, Helge Haas, Jean-Christophe Pillet, Guillaume Veux, Colin Paillet, Adeline Grenier, Névine Grenier, Zineb Saghi, Audrey Jannaud, Adrien Michon, Stéphane Vézian, Benjamin Damilano, and Bérangère Hyot "Full InGaN red emission on different InGaN pseudo-substrates for native full color micro-displays", Proc. SPIE PC12886, Gallium Nitride Materials and Devices XIX, PC1288611 (9 March 2024); https://doi.org/10.1117/12.3003161
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KEYWORDS
Indium gallium nitride

Quantum wells

Electroluminescence

Crystals

Diodes

Electric fields

Indium nitride

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