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13 March 2024 Full-wafer fabrication of all-inorganic metalenses, waveguides and diffractive optics via nanoimprint lithography
James J. Watkins, Dae Eon Jung, Vincent Einck, Lucas Verrastro, Amir Arbabi
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Proceedings Volume PC12913, Optical Architectures for Displays and Sensing in Augmented, Virtual, and Mixed Reality (AR, VR, MR) V; PC129130B (2024) https://doi.org/10.1117/12.3000364
Event: SPIE AR | VR | MR, 2024, San Francisco, California, United States
Abstract
We fabricate all-inorganic, high refractive index optics, including metalenses, waveguides, and diffractive optical elements via nanoimprint lithography with TiO2 nanoparticle dispersion inks and report full-wafer, high-throughput fabrication of waveguides and visible wavelength metalenses lenses with absolute efficiencies greater than 75% (>90% of design efficiency). We employ atomic layer deposition (ALD) as a post-imprint treatment that enables tuning of the refractive index from 1.9 to 2.25 using less than 20 cycles, which improves lens efficiency. Tuning RI of the imprinted optics to match that of the substrates removes concerns about residual layer thickness, resolving a critical issue for some applications. Additional cycles of ALD enable precise tuning of feature dimensions and feature spacings. Finally, we demonstrate the excellent optical and material stabilities of the all-inorganic imprinted optics.
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James J. Watkins, Dae Eon Jung, Vincent Einck, Lucas Verrastro, and Amir Arbabi "Full-wafer fabrication of all-inorganic metalenses, waveguides and diffractive optics via nanoimprint lithography", Proc. SPIE PC12913, Optical Architectures for Displays and Sensing in Augmented, Virtual, and Mixed Reality (AR, VR, MR) V, PC129130B (13 March 2024); https://doi.org/10.1117/12.3000364
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KEYWORDS
Nanoimprint lithography
Waveguides
Metalenses
Fabrication
Additive manufacturing
Atomic layer deposition
Refractive index
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