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Andreas Erdmann
"Imaging performance of low-n absorbers at the optical resolution limits of high NA EUV systems", Proc. SPIE PC12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC129150F (26 September 2023); https://doi.org/10.1117/12.3012444
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Andreas Erdmann, "Imaging performance of low-n absorbers at the optical resolution limits of high NA EUV systems," Proc. SPIE PC12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC129150F (26 September 2023); https://doi.org/10.1117/12.3012444