Presentation
20 June 2024 Precision Nanofabrication with Femtosecond UV Laser Interference: Compact Interferometer
Author Affiliations +
Abstract
In this presentation, we introduce a novel approach to machining surfaces using femtosecond (fs) UV laser systems. We explore the potential of these systems for large-area surface patterning, specifically in processing high band-gap materials like sapphire and yttrium aluminium garnet (YAG). The existing techniques are not satisfactory in terms of etch rates and accuracy, which our research is addressing. We demonstrate the use of two-beam fs-UV interference patterning to create harmonic gratings with exceptional accuracy. Key aspects include controlling the pulsed nature of the beams, optimizing pulse delay and spatial overlap, and comparing various beam splitting techniques. Our findings indicate that we can achieve sub-25 nm precision in material removal, which is a significant improvement over existing technologies. This research not only enhances the efficiency and accuracy of surface machining but also opens up new possibilities in advanced photonic applications.
Conference Presentation
© (2024) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Darius Gailevicius, Dominyka Stonyte, Tadas Latvys, and Domas Paipulas "Precision Nanofabrication with Femtosecond UV Laser Interference: Compact Interferometer", Proc. SPIE PC13005, Laser + Photonics for Advanced Manufacturing , PC1300505 (20 June 2024); https://doi.org/10.1117/12.3022413
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KEYWORDS
Ultraviolet radiation

Femtosecond phenomena

Imaging systems

Interferometers

Nanofabrication

Optical alignment

Optical lithography

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