CONFERENCE PROCEEDINGS
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Processing: Post-Exposure Bake
Book: Field Guide to Optical Lithography
Author(s): Chris A. Mack
Published: 2006
https://doi.org/10.1117/3.665802.p7
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Abstract
This excerpt gives a succinct explanation of Processing: Post-Exposure Bake.
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KEYWORDS
Photoresist materials
Diffusion
Chemical reactions
Chemically amplified resists
Lithography
Photoresist developing
Polymers
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