Lithography with Extreme-Ultraviolet Light

doi:10.1117/3.2576902.ch6

Book: Optical and EUV Lithography: A Modeling Perspective

Author(s): Andreas Erdmann

Published: 2021

https://doi.org/10.1117/3.2576902.ch6

Author Affiliations +

Abstract

The range of extreme-ultraviolet (EUV) or soft X-ray radiation covers the spectrum of wavelengths between 5 and 30 nm. Similar to deep-ultraviolet (DUV) lithography with exposure wavelengths of 248 nm and 193 nm, EUV lithography uses a projection optics to create a demagnified image of a mask. The short wavelength of EUV lithography can provide significantly better resolution than DUV lithography. This improvement of the resolution capabilities and the similarity to established lithographic techniques made EUV lithography a very attractive successor of 193 nm immersion lithography.