Mathematical model that describes the transition from thermal to photochemical damage in retinal pigment epithelial cell culture

Clifton D. Clark III; Michael L. Denton; Robert J. Thomas

doi:10.1117/1.3544504

1 February 2011 Mathematical model that describes the transition from thermal to photochemical damage in retinal pigment epithelial cell culture

Clifton D. Clark III, Michael L. Denton, Robert J. Thomas

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Journal of Biomedical Optics, Vol. 16, Issue 2, 020504 (February 2011). https://doi.org/10.1117/1.3544504

Abstract

We propose a rate process model for describing photochemical damage to retinal cells by short wavelength laser exposures. The rate equation for photochemical damage contains a positive rate that is temperature independent, and a negative (quenching) rate that is temperature dependent. Using the traditional Arrhenius integral to describe thermal damage, we derive damage threshold doses for both thermal and photochemical mechanisms, and show that the model accounts for the sharp transition from thermal to photochemical damage thresholds that have recently been observed in an in-vitro retinal model.

©(2011) Society of Photo-Optical Instrumentation Engineers (SPIE)

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Clifton D. Clark III, Michael L. Denton, and Robert J. Thomas "Mathematical model that describes the transition from thermal to photochemical damage in retinal pigment epithelial cell culture," Journal of Biomedical Optics 16(2), 020504 (1 February 2011). https://doi.org/10.1117/1.3544504

Published: 1 February 2011

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