Fabrication of multilevel resist patterns by using a liquid crystal mask

Piotr Slupski; Michal P. Nikodem; Liming Chai; Katarzyna Komorowska

doi:10.1117/1.OE.54.11.115107

16 November 2015 Fabrication of multilevel resist patterns by using a liquid crystal mask

Piotr Slupski, Michal P. Nikodem, Liming Chai, Katarzyna Komorowska

Author Affiliations +

Optical Engineering, Vol. 54, Issue 11, 115107 (November 2015). https://doi.org/10.1117/1.OE.54.11.115107

Abstract

Photolithographic processes of multilevel features in microfluidics can be complex and expensive. This paper demonstrates a quick method for manufacturing multilevel patterns, which is based on liquid crystal display masking during a standard lithography process for master mold fabrication for the polydimethysiloxane replica process. An active mask, based on a liquid crystal display, can simplify the process due to the ability to quickly modify designs and reduce the overhead for alignment between mask levels. The possibility of multilevel patterning, with the help of active masking, creates new opportunities for optical lithography processes. We have developed the process for a standard, mercury lamp exposure mask aligner system. The patterning characteristics were evaluated with a step pattern fabricated as an example of three-dimensional patterning for multilevel structuring. The application of a liquid crystal mask for resist contrast measurements was demonstrated.

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Piotr Slupski, Michal P. Nikodem, Liming Chai, and Katarzyna Komorowska "Fabrication of multilevel resist patterns by using a liquid crystal mask," Optical Engineering 54(11), 115107 (16 November 2015). https://doi.org/10.1117/1.OE.54.11.115107

Published: 16 November 2015

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