Evaluation Of Photomask Materials And Their Effect On Yield

M. K. Stelter; K. H. Paterson

doi:10.1117/12.954833

20 September 1976 Evaluation Of Photomask Materials And Their Effect On Yield

M. K. Stelter, K. H. Paterson

Proceedings Volume 0080, Developments in Semiconductor Microlithography; (1976) https://doi.org/10.1117/12.954833
Event: Developments in Semiconductor Microlithography, 1976, San Jose, CA, United States

Abstract

Several viable photomask materials and processing systems are evaluated with regard to their defect contribution to the overall photolithographic yield. Practical results are compared with theoretical predictions.

Citation Download Citation

M. K. Stelter and K. H. Paterson "Evaluation Of Photomask Materials And Their Effect On Yield", Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); https://doi.org/10.1117/12.954833

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