Silicon micromachining with solid-state diode-pumped lasers

Marc Nantel

doi:10.1117/12.2283866

29 August 2017 Silicon micromachining with solid-state diode-pumped lasers

Marc Nantel

Proceedings Volume 10313, Opto-Canada: SPIE Regional Meeting on Optoelectronics, Photonics, and Imaging; 103131Y (2017) https://doi.org/10.1117/12.2283866
Event: Opto-Canada: SPIE Regional Meeting on Optoelectronics, Photonics, and Imaging, 2002, Ottawa, Ontario, Canada

Abstract

We present our latest work in the laser micromachining of silicon. A kilohertz-repetition-rate diode-pumped Nd:YLF laser (in infrared, green or ultraviolet modes) is focused on the surface of silicon wafers in a chlorine atmosphere for an enhanced magnitude and control of the etching rate. In particular, the use of an infrared laser beam is singled out, along with the advantages that it holds.

Citation Download Citation

Marc Nantel "Silicon micromachining with solid-state diode-pumped lasers", Proc. SPIE 10313, Opto-Canada: SPIE Regional Meeting on Optoelectronics, Photonics, and Imaging, 103131Y (29 August 2017); https://doi.org/10.1117/12.2283866

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