Presentation + Paper
16 October 2017 Measurement of through-focus EUV pattern shifts using the SHARP actinic microscope
Author Affiliations +
Abstract
This paper provides experimental measurements of through-focus pattern shifts between contact holes in a dense array and a surrounding pattern of lines and spaces using the SHARP actinic microscope in Berkeley. Experimental values for pattern shift in EUV lithography due to 3D mask effects are extracted from SHARP microscope images and benchmarked with pattern shift values determined by rigorous simulations.
Conference Presentation
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Obert Wood II, Yulu Chen, Pawitter Mangat, Kenneth Goldberg, Markus Benk, Bryan Kasprowicz, Henry Kamberian, Jeremy McCord, and Thomas Wallow "Measurement of through-focus EUV pattern shifts using the SHARP actinic microscope", Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, 1045008 (16 October 2017); https://doi.org/10.1117/12.2280371
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Extreme ultraviolet

Photomasks

Microscopes

Extreme ultraviolet lithography

3D metrology

Image analysis

Image segmentation

Back to Top