Development of the negative-tone molecular resists for EB/EUVL having high EUV absorption capacity and molecular design method

Takashi Sato; Tomoaki Takigawa; Yuta Togashi; Takumi Toida; Masatoshi Echigo; Tetsuo Harada; Takeo Watanabe; Hiroto Kudo

doi:10.1117/12.2280514

16 October 2017 Development of the negative-tone molecular resists for EB/EUVL having high EUV absorption capacity and molecular design method

Takashi Sato, Tomoaki Takigawa, Yuta Togashi, Takumi Toida, Masatoshi Echigo, Tetsuo Harada, Takeo Watanabe, Hiroto Kudo

Author Affiliations +

Proceedings Volume 10450, International Conference on Extreme Ultraviolet Lithography 2017; 104501H (2017) https://doi.org/10.1117/12.2280514
Event: SPIE Photomask Technology and EUV Lithography, 2017, Monterey, California, United States

Abstract

In this paper, we designed the synthesis of negative-type molecular resist materials for EB and EUVL exposure tools, and their properties were examined. The resist materials for EUVL have been required showing higher sensitivity for high throughput in the lithographic process, and expecting lower shot noise to improve a roughness. In EUVL process, the resist materials must be ionized by absorbing EUV to emit more secondary electrons. The EUV absorption of the synthesized resist materials was measured using their thin films on the silicon wafer, and it was observed that the ratio of EUV absorption of the synthesized resist was higher than in the comparison of that of PHS as a reference., i.e., 2.4 times higher absorption was shown. Furthermore, we examined the relationship between the ratios of EUV absorptions and functional groups of the resist materials. As the result, the sensitivity of resist materials under EUV exposure tool was consistent with their structures.

Citation Download Citation

Takashi Sato, Tomoaki Takigawa, Yuta Togashi, Takumi Toida, Masatoshi Echigo, Tetsuo Harada, Takeo Watanabe, and Hiroto Kudo "Development of the negative-tone molecular resists for EB/EUVL having high EUV absorption capacity and molecular design method", Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, 104501H (16 October 2017); https://doi.org/10.1117/12.2280514

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