State-of-the-art of EUV materials for N5 logic and DRAM applications

Danilo De Simone; Yannick Vesters; Pieter Venelderen; Xue Ran; Ivan Pollentier; Geert Vandenberghe

doi:10.1117/12.2502915

3 October 2018 State-of-the-art of EUV materials for N5 logic and DRAM applications

Danilo De Simone, Yannick Vesters, Pieter Venelderen, Xue Ran, Ivan Pollentier, Geert Vandenberghe

Proceedings Volume 10809, International Conference on Extreme Ultraviolet Lithography 2018; 108090U (2018) https://doi.org/10.1117/12.2502915
Event: SPIE Photomask Technology + Extreme Ultraviolet Lithography, 2018, Monterey, California, United States

Abstract

In the last year, the continuous efforts on the development of extreme ultraviolet lithography (EUVL) has allowed to push the lithographic performance of the EUV photoresists on the ASML NXE:3300 full field exposure tool. However, EUVL materials are deemed as critical to enable and extend the EUV lithography technology in a cost-effective manner. In this work, we present the imec activity on EUV materials. We show the results of the best performing EUV photoresists for dense line-space pattern at 32nm pitch, dense contact holes at 36nm pitch and dense staggered pillars at Px70nm-Py40nm pitch, reporting the most critical patterning challenges for the investigated structures. We discuss manufacturing challenges as nano-failures, line-width roughness, local critical dimension (CD) uniformity, process window limitations and metal cross contamination of metal containing resist (MCR). Further, we discuss the role of the substrate underneath the EUV photoresist and alternative patterning solutions as the tone reversal process (TRP). Furthermore, we discuss novel EUV materials lain on the horizon and fundamental material aspects.

Conference Presentation

Citation Download Citation

Danilo De Simone, Yannick Vesters, Pieter Venelderen, Xue Ran, Ivan Pollentier, and Geert Vandenberghe "State-of-the-art of EUV materials for N5 logic and DRAM applications", Proc. SPIE 10809, International Conference on Extreme Ultraviolet Lithography 2018, 108090U (3 October 2018); https://doi.org/10.1117/12.2502915

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