Three-dimensional micro-cones fabricated via two-photon photolithography

Yu-Huan Liu; Xian-Zi Dong; Yuan-Yuan Zhao; Mei-Ling Zheng; Feng Jin; Jie Liu; Xuan-Ming Duan; Zhen-Sheng Zhao

doi:10.1117/12.2506108

6 February 2019 Three-dimensional micro-cones fabricated via two-photon photolithography

Yu-Huan Liu, Xian-Zi Dong, Yuan-Yuan Zhao, Mei-Ling Zheng, Feng Jin, Jie Liu, Xuan-Ming Duan, Zhen-Sheng Zhao

Proceedings Volume 10842, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology; 108420E (2019) https://doi.org/10.1117/12.2506108
Event: Ninth International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT2018), 2018, Chengdu, China

Abstract

Here, we report a preparation method to fabricate 3D micro-cones with controllable morphology based on two-photon photolithography. Two-photon photolithography offers the unique ability to create arbitrarily complex 3D polymeric structures. The voxel shape of polymerization point is crucial for the topography of the micro-cone structure. Therefore, the relationship between focused voxel features of femtosecond laser and the shape of micro-cone were analyzed systematically, and a micro-cone structure with a cone height of 2 μm, cone tip of 50 nm, and a cone angle of 20° was successfully obtained in this study. In addition, 3D micro-cone structures with 10°, 20°, and 30° sharp corners have been fabricated by means of controlling the relative movement between laser focus and moving direction. Besides, the structures with a varied slope angle from 0° to 90° on the substrate surface can be obtained by controlling the post treatment process. Furthermore, a large array of 3D micro-cones has been achieved based on the proposed preparation method.

Citation Download Citation

Yu-Huan Liu, Xian-Zi Dong, Yuan-Yuan Zhao, Mei-Ling Zheng, Feng Jin, Jie Liu, Xuan-Ming Duan, and Zhen-Sheng Zhao "Three-dimensional micro-cones fabricated via two-photon photolithography", Proc. SPIE 10842, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology, 108420E (6 February 2019); https://doi.org/10.1117/12.2506108

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