Line width roughness reduction strategies utilizing power spectral density analysis (Conference Presentation)

Charlotte A. Cutler; Dan Millward; Choong-Bong Lee; James W. Thackeray; John Nelson; Jason DeSisto; Rochelle Rena; Chris Mack

doi:10.1117/12.2551694

24 March 2020 Line width roughness reduction strategies utilizing power spectral density analysis (Conference Presentation)

Charlotte A. Cutler, Dan Millward, Choong-Bong Lee, James W. Thackeray, John Nelson, Jason DeSisto, Rochelle Rena, Chris Mack

Author Affiliations +

Proceedings Volume 11326, Advances in Patterning Materials and Processes XXXVII; 113260H (2020) https://doi.org/10.1117/12.2551694
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

Linewidth Roughness (LWR) remains a difficult challenge in resist materials. In previous work we focused on showing how roughness Power Spectral Density (PSD) parameters were affected by aerial image and basic resist parameters such as diffusion. This highlighted the relationship between PSD(0) and correlation length in optimizing LWR. By measuring the unbiased PSDs with MetroLER we showed LWR measurements could be expressed as a ratio between the roughness PSD parameters. In this paper we show how LWR improvement can be achieved by several strategies that focus on both PSD(0) and correlation length and not a single LWR number.

Conference Presentation

Citation Download Citation

Charlotte A. Cutler, Dan Millward, Choong-Bong Lee, James W. Thackeray, John Nelson, Jason DeSisto, Rochelle Rena, and Chris Mack "Line width roughness reduction strategies utilizing power spectral density analysis (Conference Presentation)", Proc. SPIE 11326, Advances in Patterning Materials and Processes XXXVII, 113260H (24 March 2020); https://doi.org/10.1117/12.2551694

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