Progress on EUV pellicle and pellicle infrastructure for high volume manufacturing

Raymond Lafarre; Raymond Maas

doi:10.1117/12.2587058

21 February 2021 Progress on EUV pellicle and pellicle infrastructure for high volume manufacturing

Raymond Lafarre, Raymond Maas

Proceedings Volume 11609, Extreme Ultraviolet (EUV) Lithography XII; 1160912 (2021) https://doi.org/10.1117/12.2587058
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

In the past year ASML NXE pellicle has made a significant steps. ASML EUV Customers can order in volume pellicles, which meet all the production KPI. The next step to meet the industry high volume manufacturing requirements, is releasing high EUV transmittance, high power compatibility and superior imaging performance membranes, made of novel materials. In this presentation we will give a comprehensive overview on the current development status of the NXE pellicle product, including a future outlook to the EUV pellicle roadmap.

Conference Presentation

Citation Download Citation

Raymond Lafarre and Raymond Maas "Progress on EUV pellicle and pellicle infrastructure for high volume manufacturing", Proc. SPIE 11609, Extreme Ultraviolet (EUV) Lithography XII, 1160912 (21 February 2021); https://doi.org/10.1117/12.2587058

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