Broadband scatterometry at extreme ultraviolet wavelengths for nanograting characterization

Moein Ghafoori; Lukas Bahrenberg; Sven Glabisch; Sophia Schroeder; Serhiy Danylyuk; Sascha Brose; Jochen Stollenwerk; Larissa Juschkin; Peter Loosen

doi:10.1117/12.2584738

22 February 2021 Broadband scatterometry at extreme ultraviolet wavelengths for nanograting characterization

Moein Ghafoori, Lukas Bahrenberg, Sven Glabisch, Sophia Schroeder, Serhiy Danylyuk, Sascha Brose, Jochen Stollenwerk, Larissa Juschkin, Peter Loosen

Author Affiliations +

Proceedings Volume 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV; 116112F (2021) https://doi.org/10.1117/12.2584738
Event: SPIE Advanced Lithography, 2021, Online Only

Conference Poster

Abstract

The authors present a novel approach for the structural characterization of periodic nanostructures using spectrally resolved broadband scatterometry in the extreme ultraviolet (EUV) wavelength range. The implemented metrology method combines 0th and ±1st diffraction order spectrum measurements of a nanograting under broadband illumination from 8 nm to 17 nm for model-based reconstruction of geometrical parameters. For the experimental investigations, a compact stand-alone scatterometer setup is designed and realized. The setup enables measurements of spectrally resolved 0th and ±1st diffraction orders of a grating that is illuminated at various grazing incidence angles. The acquired data serves as a basis for the reconstruction of the grating’s geometry using rigorous optical finite element method (FEM). The method is applied to arrays of lines and spaces with sub-100 nm feature size.

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Moein Ghafoori, Lukas Bahrenberg, Sven Glabisch, Sophia Schroeder, Serhiy Danylyuk, Sascha Brose, Jochen Stollenwerk, Larissa Juschkin, and Peter Loosen "Broadband scatterometry at extreme ultraviolet wavelengths for nanograting characterization", Proc. SPIE 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, 116112F (22 February 2021); https://doi.org/10.1117/12.2584738

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