19 December 2022Analyzing the tolerances on direct laser writing of two-dimensional Dammann gratings and performing the software correction of writing modes
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As applied to a maskless laser lithography writing system Heidelberg DWL 66+ and the photoresist-chromium technology, we have found the tolerances on fabricating the binary-phase Dammann gratings having 7x7 useful diffraction orders and a structure separable in X and Y components and illuminated by a beam with a wavelength of 633 nm. It has been found that the obtained tolerances guarantee the production of Dammann gratings with a total diffraction efficiency close to the theoretical one and a root-mean-square error of departure of the intensity of useful diffraction orders of less than 10%.
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Victor P. Korolkov, Andrey G. Sedukhin, Roman I. Kuts, Vadim V. Cherkashin, Sergey K. Golubtsov, Anatoly I. Malyshev, Dmitrij A. Belousov, "Analyzing the tolerances on direct laser writing of two-dimensional Dammann gratings and performing the software correction of writing modes," Proc. SPIE 12318, Holography, Diffractive Optics, and Applications XII, 123182G (19 December 2022); https://doi.org/10.1117/12.2643720