Paper
17 March 2023 Production of dielectric filters with low defect levels for integrated optical devices
Author Affiliations +
Abstract
We have assessed and reduced the particle count in coatings from a magnetron sputter coater used for production of optical coatings for applications in photonics and semiconductor industry. Results for particle levels in single layers from Al2O3, SiO2, Nb2O5, Ta2O5, and TiO2 showed semiconductor grade particle levels for the upgraded deposition system. Moreover, particle levels were also investigated for optical filter stacks deposited on bare Si, glass substrates and actual CMOS device wafers, which were used for the manufacturing of hyperspectral imaging (HSI) sensors. In all cases, low particle counts were detected in the optical filters as expected from the results obtained for the single layer. It could be shown that the coating on the device wafers had no negative impact on the production yield of the HSI sensors.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stephan Mingels, Navas Kutty, Nicolaas Tack, Dries Bangels, Elias Janssens, and Harro Hagedorn "Production of dielectric filters with low defect levels for integrated optical devices", Proc. SPIE 12424, Integrated Optics: Devices, Materials, and Technologies XXVII, 124241J (17 March 2023); https://doi.org/10.1117/12.2667774
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Particles

Semiconducting wafers

Optical coatings

Optical filters

Coating thickness

Semiconductors

Dielectric filters

RELATED CONTENT


Back to Top