Stress analysis by finite element method stress for (ZrO2/SiO2)2 anti-reflector multi-layer deposited with ion-assisted electron-gun evaporation

Chih-Yuan Chang; Hsi-Chao Chen; Chun-Hao Chang; Kun-Hong Chen; Cheng-En Cai; Wei-Xiang Wang

doi:10.1117/12.2660162

8 December 2022 Stress analysis by finite element method stress for (ZrO₂/SiO₂)² anti-reflector multi-layer deposited with ion-assisted electron-gun evaporation

Chih-Yuan Chang, Hsi-Chao Chen, Chun-Hao Chang, Kun-Hong Chen, Cheng-En Cai, Wei-Xiang Wang

Author Affiliations +

Proceedings Volume 12480, Optical Technology and Measurement for Industrial Applications Conference 2022; 1248009 (2022) https://doi.org/10.1117/12.2660162
Event: Optics and Photonics International Congress, 2022, Yokohama, Japan

Abstract

The research proposal was used the electron-gun evaporation with ion-assisted deposition method to deposit zirconium dioxide (ZrO₂) thin films on PET and PC flexible substrates. Then, the finite element method (FEM) with equivalent room temperature (ERT) could simulated the intrinsic stress of these AR multi-layer films. The self-made phase-shifting Moiré interferometer can verify the residual stress of these AR multilayer films. However, a polynomial fixing curvature was used to reduce the simulation error of intrinsic stress low to 1%. The residual stress of AR multilayer films deposited with electron-gun evaporation can be reduced to -279.3MPa.

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Chih-Yuan Chang, Hsi-Chao Chen, Chun-Hao Chang, Kun-Hong Chen, Cheng-En Cai, and Wei-Xiang Wang "Stress analysis by finite element method stress for (ZrO₂/SiO₂)² anti-reflector multi-layer deposited with ion-assisted electron-gun evaporation", Proc. SPIE 12480, Optical Technology and Measurement for Industrial Applications Conference 2022, 1248009 (8 December 2022); https://doi.org/10.1117/12.2660162

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