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6 October 2023 Characterization of customized curved gratings made with electron-beam lithography
Casey T. DeRoo, Cecilia Fasano, Fabien Grisé, Randall McEntaffer
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Proceedings Volume 12679, Optics for EUV, X-Ray, and Gamma-Ray Astronomy XI; 126790M (2023) https://doi.org/10.1117/12.2677416
Event: SPIE Optical Engineering + Applications, 2023, San Diego, California, United States
Abstract
High performance reflection gratings on freeform surfaces and/or with customized groove patterns are highly desirable from an instrument design perspective. Such dispersive elements would have the potential to unlock innovative optical designs, achieve high performance in limited volumes, or enable aberration-correction. We report on an effort to make customized gratings using electron-beam lithography (EBL) and to characterize their performance using interferometric measurements. We describe the design, manufacture, and measurement of two moderate-format (10 mm x 30 mm) gratings fabricated on cylindrical substrates and we quantify the limiting spectral resolution of these gratings.
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Casey T. DeRoo, Cecilia Fasano, Fabien Grisé, and Randall McEntaffer "Characterization of customized curved gratings made with electron-beam lithography", Proc. SPIE 12679, Optics for EUV, X-Ray, and Gamma-Ray Astronomy XI, 126790M (6 October 2023); https://doi.org/10.1117/12.2677416
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KEYWORDS
Reflection gratings
Lithography
Optical gratings
Design and modelling
Wavefronts
Optical design
Quality measurement
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