Device for measuring stress stability in reflective coatings for thin x-ray mirrors

Mallory M. Whalen; Ralf K. Heilmann; Mark L. Schattenburg

doi:10.1117/12.2677492

5 October 2023 Device for measuring stress stability in reflective coatings for thin x-ray mirrors

Mallory M. Whalen, Ralf K. Heilmann, Mark L. Schattenburg

Proceedings Volume 12679, Optics for EUV, X-Ray, and Gamma-Ray Astronomy XI; 126790P (2023) https://doi.org/10.1117/12.2677492
Event: SPIE Optical Engineering + Applications, 2023, San Diego, California, United States

Abstract

A novel device that uses the membrane resonance method of measuring stress in thin films to track the stress stability of candidate x-ray reflective coatings is presented. The device is capable of tracking stress changes below 0.1 N/m, which is the threshold where stress-based mirror deformations and resulting degradation of angular resolution can become problematic for next-generation x-ray observatories. The device can be used to determine optimal coatings by evaluating the stress stability of different metals and heat treatments.

Conference Presentation

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Mallory M. Whalen, Ralf K. Heilmann, and Mark L. Schattenburg "Device for measuring stress stability in reflective coatings for thin x-ray mirrors", Proc. SPIE 12679, Optics for EUV, X-Ray, and Gamma-Ray Astronomy XI, 126790P (5 October 2023); https://doi.org/10.1117/12.2677492

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