Development progress of Sn-LPP EUV light source for inspection systems

Yuichi Nishimura; Yoshifumi Ueno; Shinji Nagai; Fumio Iwamoto; Kenichi Miyao; Hideyuki Hayashi; Takuya Ishii; Tamotsu Abe; Hiroaki Nakarai; Takashi Saitou

doi:10.1117/12.2686618

21 November 2023 Development progress of Sn-LPP EUV light source for inspection systems

Yuichi Nishimura, Yoshifumi Ueno, Shinji Nagai, Fumio Iwamoto, Kenichi Miyao, Hideyuki Hayashi, Takuya Ishii, Tamotsu Abe, Hiroaki Nakarai, Takashi Saitou

Author Affiliations +

Proceedings Volume 12750, International Conference on Extreme Ultraviolet Lithography 2023; 127500V (2023) https://doi.org/10.1117/12.2686618
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Conference Poster

Abstract

Gigaphoton Inc. presents a Sn-LPP EUV light source for mask inspection tools. It is based on a minimum-mass Sn droplet generator with an in-line Sn fuel supply system, a double-pulse laser irradiation scheme with precise shooting control and a debris mitigation technology with H₂ buffer-gas flow. A brightness of 120W/mm² sr at the plasma point without reflectivity degradation of the EUV collector mirror after 500 hours continuous operation has been demonstrated with a very low EUV energy 3σ-value of 5%.

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

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Yuichi Nishimura, Yoshifumi Ueno, Shinji Nagai, Fumio Iwamoto, Kenichi Miyao, Hideyuki Hayashi, Takuya Ishii, Tamotsu Abe, Hiroaki Nakarai, and Takashi Saitou "Development progress of Sn-LPP EUV light source for inspection systems", Proc. SPIE 12750, International Conference on Extreme Ultraviolet Lithography 2023, 127500V (21 November 2023); https://doi.org/10.1117/12.2686618

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