Non-PFAS biomass EUV resist for sustainable semiconductor manufacturing

Kazuyo Morita

doi:10.1117/12.3010636

9 April 2024 Non-PFAS biomass EUV resist for sustainable semiconductor manufacturing

Kazuyo Morita

Author Affiliations +

Proceedings Volume 12957, Advances in Patterning Materials and Processes XLI; 1295718 (2024) https://doi.org/10.1117/12.3010636
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

A non-PFAS biomass EUV resist is proposed as a sustainable material for reducing PFAS and CO₂ emissions. It was demonstrated that HP 8nm L/S pattern formation with a non-PFAS biomass EUV resist for beyond 2nm node. Furthermore, biomass developer and rinse for non-PFAS biomass EUV resists are proposed to improve biomass content. This proves that the non-PFAS biomass EUV resist can be used in high-NA EUV lithography at 8nm.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Kazuyo Morita "Non-PFAS biomass EUV resist for sustainable semiconductor manufacturing", Proc. SPIE 12957, Advances in Patterning Materials and Processes XLI, 1295718 (9 April 2024); https://doi.org/10.1117/12.3010636

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