MEMS-on-CMOS integration of a holographic 8M-pixel SLM device using KrF-lithography

S. Döring; P. A. Recknagel; C. Hohle; P. Dürr

doi:10.1117/12.3010154

9 April 2024 MEMS-on-CMOS integration of a holographic 8M-pixel SLM device using KrF-lithography

S. Döring, P. A. Recknagel, C. Hohle, P. Dürr

Proceedings Volume 12958, Advanced Etch Technology and Process Integration for Nanopatterning XIII; 1295809 (2024) https://doi.org/10.1117/12.3010154
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

We discuss the process integration to manufacture a spatial light modulator (SLM) device for application in mixed and augmented reality. The MEMS-part of the device is integrated on an external 180nm CMOS. The SLM consists of an 8MPixel micro mirror array with a pixel size of 4μm x 6μm. To provide the vertical strokes necessary for RGB color image generation, a comb-drive actuator concept was developed. Besides the yoke and the stator of the comb-drive, the actuator uses a double spring structure to reduce tilting of the mirror and other stress-induced effects. At the beginning of the product development we used iLine-lithography only, while later for the final device we switched to KrF-lithography to provide the necessary feature size down to 200nm as well as better CD-uniformity and overlay specification. We describe the process development, with focus on the lithography and etching processes for the actuator. Especially the different processes for patterning the Titanium-Aluminum structures of ultra-thin springs as well as the yoke and the stator with their high aspect ratios, which are specific for MEMS processing. Finally we achieved post-etch CD-uniformity <10nm per wafer for all metal structures as well on-product-overlay accuracy <15nm.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

S. Döring, P. A. Recknagel, C. Hohle, and P. Dürr "MEMS-on-CMOS integration of a holographic 8M-pixel SLM device using KrF-lithography", Proc. SPIE 12958, Advanced Etch Technology and Process Integration for Nanopatterning XIII, 1295809 (9 April 2024); https://doi.org/10.1117/12.3010154

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