Paper
18 December 2023 Interference lithography based on a phase mask for the fabrication of diffraction gratings
Shuhu Huan, Manman Sun, Shiyang Li, Ying Liu, Yilin Hong
Author Affiliations +
Proceedings Volume 12964, AOPC 2023: Optical Design and Manufacturing ; 129640D (2023) https://doi.org/10.1117/12.3006776
Event: Applied Optics and Photonics China 2023 (AOPC2023), 2023, Beijing, China
Abstract
Diffraction gratings have various optical properties such as dispersion, polarization, anti-reflection, and waveguiding, and are widely used in astronomical spectroscopy, holographic display, precision measurement, and other applications. The interference lithography method based on a phase mask uses the interference between diffracted orders of the phase mask to produce periodic patterns. Compared with conventional interference lithography, it has the characteristics of a simple and compact structure of the exposure system. The feature size of the transferable pattern is small, and currently, up to several hundred nanometers can be resolved and prepared; the grating parameters are repeatedly stable and suitable for producing a small number of gratings. First, this method is valuable in replicating diffraction gratings at low cost and high productivity. Moreover, combined with meta-structured phase masks, it can still have academic potential in preparing complex meta-structured patterns.
(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Shuhu Huan, Manman Sun, Shiyang Li, Ying Liu, and Yilin Hong "Interference lithography based on a phase mask for the fabrication of diffraction gratings", Proc. SPIE 12964, AOPC 2023: Optical Design and Manufacturing , 129640D (18 December 2023); https://doi.org/10.1117/12.3006776
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KEYWORDS
Lithography

Diffraction gratings

Fabrication

Diffraction

Etching

Photoresist materials

Near field

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