Paper
1 October 1990 Film growth mode and related film properties in pulsed laser-plasma deposition
Simeon Metev, Krassimira Meteva
Author Affiliations +
Proceedings Volume 1352, 1st Intl School on Laser Surface Microprocessing; (1990) https://doi.org/10.1117/12.23722
Event: International School on Laser Surface Microprocessing, 1989, Tashkent, Uzbekistan
Abstract
In the paper the results of a theoretical investigation of the growth process of laserplasma deposited thin films are discussed. A kinetic approach has been used to establish direct relation between experimental conditions (laser flux density substrate temperature) and film properties (thickness structure) . The results of some ex perimental investigations of the deposition process are presented confirming the general conclusions of the developed theoretical mo del. 1 .
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Simeon Metev and Krassimira Meteva "Film growth mode and related film properties in pulsed laser-plasma deposition", Proc. SPIE 1352, 1st Intl School on Laser Surface Microprocessing, (1 October 1990); https://doi.org/10.1117/12.23722
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Cited by 1 scholarly publication.
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KEYWORDS
Plasma

Thin films

Technetium

Crystals

Pulsed laser deposition

Deposition processes

Ionization

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