Multilayer optics for soft x-ray projection lithography: problems and prospects

Daniel Gorman Stearns; Natale M. Ceglio; Andrew M. Hawryluk; Robert S. Rosen; Stephen P. Vernon

doi:10.1117/12.47345

1 August 1991 Multilayer optics for soft x-ray projection lithography: problems and prospects

Daniel Gorman Stearns, Natale M. Ceglio, Andrew M. Hawryluk, Robert S. Rosen, Stephen P. Vernon

Proceedings Volume 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing; (1991) https://doi.org/10.1117/12.47345
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

The current state-of-the-art in multilayer x-ray optics is presented, and the specific problems posed by projection lithography are considered. To make soft x-ray projection lithography a viable technology, the multilayer optics must demonstrate both high normal incidence reflectivity and long-term stability in the potential hostile lithography environment.

Citation Download Citation

Daniel Gorman Stearns, Natale M. Ceglio, Andrew M. Hawryluk, Robert S. Rosen, and Stephen P. Vernon "Multilayer optics for soft x-ray projection lithography: problems and prospects", Proc. SPIE 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing, (1 August 1991); https://doi.org/10.1117/12.47345

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