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We have successfully demonstrated double pass enhancement of amplified spontaneous emission of soft x rays, 23.2 and 23.6 nm of 3p - 3s transitions in Ne-like Ge, using an x-ray multilayer mirror. In this paper, we report on the fabrication of the mirror and analysis of its damage suffered during the experiments. The mirror used was a Mo-Si multilayer mirror with the reflectivity of 35% at the wavelength of 23.6 nm, deposited by an rf-sputtering system. In the damaged area of the mirror, only the multilayer was locally evaporated and the bare substrate underneath appeared. The size of the damaged area corresponded to the aperture size. We carried out the simulation on the spatial and temporal distribution of the mirror temperature during the experiment. Assuming that thermal x rays enter the mirror with the largest amount of energy among all the fluxes at the early stage of the enhancement, the result of the simulation can explain the damage feature and the temporal profile of the intensity of the amplified spontaneous emissions.
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