Phase-contrast lithography

Chris A. Mack

doi:10.1117/12.150448

8 August 1993 Phase-contrast lithography

Chris A. Mack

Proceedings Volume 1927, Optical/Laser Microlithography; (1993) https://doi.org/10.1117/12.150448
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

This paper analyzes theoretically the potential for a novel approach to lithographic imaging: phase contrast lithography. In this approach, a unique chromeless phase shifting mask is combined with a specific phase filter at the pupil plane to produce high contrast images projected onto the wafer. Like the phase contrast microscope, the pupil filter is designed to phase-shift the zero order diffracted light by some angle. The design of the chromeless mask is purposely kept simple using essentially the same design information as for a conventional chrome/glass mask. Initial analysis of the phase contrast lithography technique reveals some problems, especially proximity effects.

Citation Download Citation

Chris A. Mack "Phase-contrast lithography", Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); https://doi.org/10.1117/12.150448

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available