Paper
1 February 1994 Effects of heat load on the performance of a grating monochromator on an undulator beamline: simulation
H. Raul Beguiristain, Masato Koike, Takeshi Namioka
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Abstract
A new simulation method has been developed for evaluating the performance of a monochromator whose grating is exposed to intense undulator radiation. Analytic expressions for the thermally deformed surface figure and distorted groove pattern of the grating are determined first by a finite element method and then they are incorporated into a ray tracing procedure. The method is applied to a simple beamline optics consisting of a U3.9 undulator of the Advanced Light Source and a water-cooled metal grating to see whether this objective monochromator can stand for heat load without degrading its designed performance. The results show that the simulation method is capable of evaluating the performance of a thermally distorted grating and that the heat load would not cause any significant degradation in the spectral resolution and throughput.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
H. Raul Beguiristain, Masato Koike, and Takeshi Namioka "Effects of heat load on the performance of a grating monochromator on an undulator beamline: simulation", Proc. SPIE 2011, Multilayer and Grazing Incidence X-Ray/EUV Optics II, (1 February 1994); https://doi.org/10.1117/12.167224
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CITATIONS
Cited by 1 scholarly publication.
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KEYWORDS
Monochromators

Ray tracing

Optical simulations

Thermal effects

Diffraction gratings

Light sources

Metals

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