Contamination of surfaces prior to optical coating by in-situ total internal reflection microscopy

David W. Reicher; Kenneth C. Jungling; Charles K. Carniglia

doi:10.1117/12.180908

28 July 1994 Contamination of surfaces prior to optical coating by in-situ total internal reflection microscopy

David W. Reicher, Kenneth C. Jungling, Charles K. Carniglia

Proceedings Volume 2114, Laser-Induced Damage in Optical Materials: 1993; (1994) https://doi.org/10.1117/12.180908
Event: Laser-Induced Damage in Optical Materials: 1993, 1993, Boulder, CO, United States

Abstract

Scatter in thin film optical coatings may arise from a variety of sources. Our previous investigations have used total internal reflection microscopy (TIRM) to monitor scatter site generation during film growth. These studies have reported the effects of substrate cleaning techniques and certain deposition parameters on scatter site generation. The present investigation using TIRM to monitor the coating process has yielded new insight into defect generating mechanisms for films of HfO₂ and ZrO₂. Of particular interest is surface contamination apparently caused by electrostatic effects. Introduction of high electric potentials in the vacuum chamber has been observed to cause surface contamination prior to deposition, resulting in a significant increase in the number of scatter sites.

Citation Download Citation

David W. Reicher, Kenneth C. Jungling, and Charles K. Carniglia "Contamination of surfaces prior to optical coating by in-situ total internal reflection microscopy", Proc. SPIE 2114, Laser-Induced Damage in Optical Materials: 1993, (28 July 1994); https://doi.org/10.1117/12.180908

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