Fabrication of 1D gratings on photoresist for light-scattering and memory-effect measurements

Zu-Han Gu; Michel A. Josse

doi:10.1117/12.240961

7 June 1996 Fabrication of 1D gratings on photoresist for light-scattering and memory-effect measurements

Zu-Han Gu, Michel A. Josse

Proceedings Volume 2726, Optical Microlithography IX; (1996) https://doi.org/10.1117/12.240961
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

An optical method of fabricating one- and two-dimensional diffraction gratings is described. As opposed to conventional gratings which feature regularly spaced grooves, these gratings have variable profiles which represent mathematical functions previously defined. These surface profiles are produced by a laser beam exposing photoresist-coated plates with a raster scanner under computer control. Two kinds of 1-D profiles for the gratings have been made: (1) Deterministic: the profile represents a mathematical function; and (2) Random: gratings possess random profile with certain statistical distributions. Several surfaces have been fabricated and characterized with a stylus profilometer. By changing surface deterministic and statistical properties, the light-scattering in the far-field can be controlled for many optical applications.

Citation Download Citation

Zu-Han Gu and Michel A. Josse "Fabrication of 1D gratings on photoresist for light-scattering and memory-effect measurements", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); https://doi.org/10.1117/12.240961

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