Measurement of microlithography aerial image quality

Joseph P. Kirk; Timothy A. Brunner

doi:10.1117/12.240915

7 June 1996 Measurement of microlithography aerial image quality

Joseph P. Kirk, Timothy A. Brunner

Proceedings Volume 2726, Optical Microlithography IX; (1996) https://doi.org/10.1117/12.240915
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

The aerial image formed by a microlithography lens places fundamental limits on the size and density of patterns that are manufactured by that lens. In the past, the lithographer was unable to directly measure the dose distribution in this aerial image. Highly absorbing photoresists have continuous tone relief response to dose variations and this relief is a record of the dose distribution in an image. It is shown how high resolution measurement of that relief by an atomic force microprobe gives the lithographer a sampling of the spatial distribution of dose within the image.

Citation Download Citation

Joseph P. Kirk and Timothy A. Brunner "Measurement of microlithography aerial image quality", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); https://doi.org/10.1117/12.240915

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