Advances in process matching for rules-based optical proximity correction

Oberdan W. Otto; Richard C. Henderson

doi:10.1117/12.262828

27 December 1996 Advances in process matching for rules-based optical proximity correction

Oberdan W. Otto, Richard C. Henderson

Proceedings Volume 2884, 16th Annual BACUS Symposium on Photomask Technology and Management; (1996) https://doi.org/10.1117/12.262828
Event: 16th Annual BACUS Symposium on Photomask Technology and Management, 1996, Redwood City, CA, United States

Abstract

This paper reports advances to the Parametric Anchoring methodology in which a small number of representative line- space process measurements can be used to fit a process model to be used for Optical Proximity Correction (OPC). A correction rule table generation program uses the model to create the correction lookup tables to be used by a rules- based OPC correction program. The results of matching the process model to a variety of processes are shown.

Citation Download Citation

Oberdan W. Otto and Richard C. Henderson "Advances in process matching for rules-based optical proximity correction", Proc. SPIE 2884, 16th Annual BACUS Symposium on Photomask Technology and Management, (27 December 1996); https://doi.org/10.1117/12.262828

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