Growth and characterization of Nd:YAG epitaxial planar waveguides by pulsed laser deposition

Mizunori Ezaki; Minoru Obara; Kyoichi Adachi; Hiroshi Kumagai; Koichi Toyoda

doi:10.1117/12.270235

4 April 1997 Growth and characterization of Nd:YAG epitaxial planar waveguides by pulsed laser deposition

Mizunori Ezaki, Minoru Obara, Kyoichi Adachi, Hiroshi Kumagai, Koichi Toyoda

Proceedings Volume 3092, XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference; (1997) https://doi.org/10.1117/12.270235
Event: XI International Symposium on Gas Flow and Chemical Lasers and High Power Laser Conference, 1996, Edinburgh, United Kingdom

Abstract

Epitaxial rare-earth (Re: Nd, Yb) doped yttrium aluminum garnet (Re_x:Y_3-xAl₅O₁₂ or Re:YAG) films have been grown on various substrates by pulsed laser deposition for the purpose of fabricating diode-pumped waveguide lasers. The films were characterized by Rutherford backscattering, x- ray diffraction, and photo-luminescence measurements. These Nd:YAG films on (100) silicon substrate having a large lattice mismatch show oriented stoichiometric growth. On the other hand, the films of rare-earth doped YAG on garnet substrates show the epitaxial growth with the smooth surfaces. Their characterization of rare-earth doped YAG thin films on various substrates was comparable to that of the Nd:YAG bulk laser crystal.

Citation Download Citation

Mizunori Ezaki, Minoru Obara, Kyoichi Adachi, Hiroshi Kumagai, and Koichi Toyoda "Growth and characterization of Nd:YAG epitaxial planar waveguides by pulsed laser deposition", Proc. SPIE 3092, XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (4 April 1997); https://doi.org/10.1117/12.270235

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