Proposal for polymer photonic bandgap materials fabricated by dry etching and diffusion

Hans W. P. Koops

doi:10.1117/12.284107

22 September 1997 Proposal for polymer photonic bandgap materials fabricated by dry etching and diffusion

Hans W. P. Koops

Proceedings Volume 3135, Precision Plastic Optics for Optical Storage, Displays, Imaging, and Communications; (1997) https://doi.org/10.1117/12.284107
Event: Optical Science, Engineering and Instrumentation '97, 1997, San Diego, CA, United States

Abstract

A method to produce polymer-based passive and active photonic bandgap devices for integrated optics is described. The aim of the method is to implement low-cost active and passive opto-electronic devices of high quality with a high degree of integration and high packing density. A structurable resist or polymer layer of high quality is placed onto an opto-electronic substrate. An etching mask and a high-grade anisotropical in-depth etching process are used to generate a structure which can be used as a photonic bandgap material. The permittivity of the structure is changed by filling the polymer structure with monomers by means of a vapor-phase or liquid-phase diffusion. Depending on the monomer type used for diffusion as well as on temperature and on interaction time, the optical properties of an optical element can be changed selectively. The method described will make possible an increase in the packing density of future integrated optics and low-cost production of large quantities alike.

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Hans W. P. Koops "Proposal for polymer photonic bandgap materials fabricated by dry etching and diffusion", Proc. SPIE 3135, Precision Plastic Optics for Optical Storage, Displays, Imaging, and Communications, (22 September 1997); https://doi.org/10.1117/12.284107

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KEYWORDS

Polymers

Diffusion

Etching

Photomasks

Integrated optics

Chemical elements

Optical components

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