Paper
27 August 1997 Device performance and optimization for 5th- and 6th-generation microprocessors
Bijnan Bandyopadhyay, Jon Cheek, Robert Dawson, Michael Duane, Jim Fulford, Mark I. Gardner, Fred N. Hause, Bernard Ho, Daniel Kadoch, Raymond Lee, Ming-Yin Hao, Chuck May, Mark Michael, Brad Moore, Deepak Nayak, John L. Nistler, Dirk Wristers
Author Affiliations +
Abstract
A family of CMOS processing technologies used to produce AMDs fifth and sixth generation microprocessors (K5 and K6) is described. Some of the issues that arose during the technology development and the transfer to manufacturing are also presented. Transistor performance is compared to literature results and shown to be best in its class.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bijnan Bandyopadhyay, Jon Cheek, Robert Dawson, Michael Duane, Jim Fulford, Mark I. Gardner, Fred N. Hause, Bernard Ho, Daniel Kadoch, Raymond Lee, Ming-Yin Hao, Chuck May, Mark Michael, Brad Moore, Deepak Nayak, John L. Nistler, and Dirk Wristers "Device performance and optimization for 5th- and 6th-generation microprocessors", Proc. SPIE 3212, Microelectronic Device Technology, (27 August 1997); https://doi.org/10.1117/12.284617
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Oxides

Transistors

Manufacturing

Metals

Reliability

Boron

Capacitance

RELATED CONTENT

Bipolar transistor in VESTIC technology
Proceedings of SPIE (July 25 2013)
Bipolar transistor in VESTIC technology: prototype
Proceedings of SPIE (December 22 2016)
Wafer level reliability
Proceedings of SPIE (January 14 1993)
Microprocessor technology challenges through the next decade
Proceedings of SPIE (September 03 1998)

Back to Top